Template: dpm:SampleProductionThinFilmSampleSputterSource

URI: https://www.dipromag.de/dipromag_onto/0.1/SampleProductionThinFilmSampleSputterSource

Parameters

🛈 The parameters defined by the signature are listed here. Unfortunately parameter names are not informative; fixing it is a planned future feature. An optional parameter will accept the value ottr:none as an argument. A parameter which allows blanks will accept a blank node as argument value.

Pattern

stOTTR

🛈 stOTTR serialisation of the template without annotation instances.

dpm:SampleProductionThinFilmSampleSputterSource[
    ottr:IRI ?source_name,
    ottr:IRI ?source_compound,
    xsd:float ?target_purity_unit_percent,
    xsd:float ?target_diameter_unit_m
] :: {
    ottr:Triple(?source_name, dpm:intendedCompound, ?source_compound),
    o-owl-ax:SubClassOf(dpm:SputterSource, pmd:ManufactureProcess),
    o-rdf:Type(?source_name, dpm:SputterSource),
    o-rdfs:Label(dpm:SputterSource, "Sputter Source"),
    dpm:HasCharacteristicNumerical(?source_name, (pmd:SetPoint, qudt:Diameter), ?target_diameter_unit_m, qudt:M),
    dpm:HasCharacteristicNumerical(?source_name, (pmd:SetPoint, dpm:Purity), ?target_purity_unit_percent, qudt:PERCENT)
} .

🛈 The pattern of the template is illustrated by expanding a generated instance. Below the generated instance is shown in different serialisations, and its expansion is presented in different formats.

Generated instance

dpm:SampleProductionThinFilmSampleSputterSource(x:argument1, x:argument2, _:argument3, _:argument4)

[ ottr:of      dpm:SampleProductionThinFilmSampleSputterSource ;
  ottr:values  ( x:argument1 x:argument2
                 [] 
                 [] 
               )
] .

Visualisation of expanded RDF graph

🛈 Each resource node is linked to its IRI. Type relationships are not visualised, rather each node contains its type.

Expanded RDF graph

qudt:PERCENT  rdfs:subClassOf  qudt:Unit .

x:argument1  rdf:type         dpm:SputterSource ;
        pmd:characteristic    [ rdf:type   dpm:Purity , pmd:SetPoint ;
                                pmd:unit   qudt:PERCENT ;
                                pmd:value  [] 
                              ] ;
        pmd:characteristic    [ rdf:type   qudt:Diameter , pmd:SetPoint ;
                                pmd:unit   qudt:M ;
                                pmd:value  [] 
                              ] ;
        dpm:intendedCompound  x:argument2 .

dpm:SputterSource  rdfs:label  "Sputter Source" ;
        rdfs:subClassOf  pmd:ManufactureProcess .

qudt:M  rdfs:subClassOf  qudt:Unit .

Interactive expansion

🛈 Click the list to expand/contract one list element. Click 'expand/contact all' to expand/contract all elements. Note that the interactive expansion is not correct for instances that are marked by list expanders.

Dependencies

Dependency graph

🛈 The graph shows all the templates that this template depends on. The colour of the node indicates its namespace. Each node is linked to its documentation page.

List of dependencies

🛈 The number in parenthesis is the number of instances of each template.

Depending templates

🛈 The templates in this library that depend on this template.

None found.

Metrics

🛈 Dependency graph metrics. Depth is the number of steps to a leaf node in the dependency graph. Branching is the number of outgoing edges from a node.

• Max. dependency depth: 4
• Min. dependency depth: 1
• Max. branching: 6
• Min. branching: 1

Templates used

Vocabulary introduced

Serialisations

dpm:SampleProductionThinFilmSampleSputterSource[
    ottr:IRI ?source_name,
    ottr:IRI ?source_compound,
    xsd:float ?target_purity_unit_percent,
    xsd:float ?target_diameter_unit_m
] :: {
    ottr:Triple(?source_name, dpm:intendedCompound, ?source_compound),
    o-owl-ax:SubClassOf(dpm:SputterSource, pmd:ManufactureProcess),
    o-rdf:Type(?source_name, dpm:SputterSource),
    o-rdfs:Label(dpm:SputterSource, "Sputter Source"),
    dpm:HasCharacteristicNumerical(?source_name, (pmd:SetPoint, qudt:Diameter), ?target_diameter_unit_m, qudt:M),
    dpm:HasCharacteristicNumerical(?source_name, (pmd:SetPoint, dpm:Purity), ?target_purity_unit_percent, qudt:PERCENT)
} .

dpm:SampleProductionThinFilmSampleSputterSource
        rdf:type         ottr:Template ;
        ottr:parameters  ( [ ottr:name      "source_name" ;
                             ottr:type      ottr:IRI ;
                             ottr:variable  _:b0
                           ]
                           [ ottr:name      "source_compound" ;
                             ottr:type      ottr:IRI ;
                             ottr:variable  _:b1
                           ]
                           [ ottr:name      "target_purity_unit_percent" ;
                             ottr:type      xsd:float ;
                             ottr:variable  _:b2
                           ]
                           [ ottr:name      "target_diameter_unit_m" ;
                             ottr:type      xsd:float ;
                             ottr:variable  _:b3
                           ]
                         ) ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicNumerical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint dpm:Purity )
                                          _:b2
                                          qudt:PERCENT
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:SputterSource "Sputter Source" )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdf:Type ;
                           ottr:values  ( _:b0
                                          dpm:SputterSource
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicNumerical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint qudt:Diameter )
                                          _:b3
                                          qudt:M
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:SputterSource pmd:ManufactureProcess )
                         ] ;
        ottr:pattern     [ ottr:of      ottr:Triple ;
                           ottr:values  ( _:b0
                                          dpm:intendedCompound
                                          _:b1
                                        )
                         ] .

🛈 Prefixes are removed from all listings on this page for readability, but are listed here in RDF Turtle format.

@prefix ottr:       <http://ns.ottr.xyz/0.4/>.
@prefix qudt:       <http://qudt.org/vocab/>.
@prefix o-owl-ax:   <http://tpl.ottr.xyz/owl/axiom/0.1/>.
@prefix o-rdf:      <http://tpl.ottr.xyz/rdf/0.1/>.
@prefix o-rdfs:     <http://tpl.ottr.xyz/rdfs/0.2/>.
@prefix rdf:        <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix xsd:        <http://www.w3.org/2001/XMLSchema#>.
@prefix pmd:        <https://w3id.org/pmd/co/>.
@prefix dpm:        <https://www.dipromag.de/dipromag_onto/0.1/>.