dpm:SampleProductionThinFilmSampleSputterParameters🛈 The parameters defined by the signature are listed here. Unfortunately parameter names are not informative; fixing it is a planned future feature. An optional parameter will accept the value ottr:none as an argument. A parameter which allows blanks will accept a blank node as argument value.
| Index | Name | Type | Optional | Blanks allowed | Default value |
|---|---|---|---|---|---|
| 1 | sputter_parameter_name | ottr:IRI | no | yes | no |
| 2 | sources | NEList<ottr:IRI> | no | yes | no |
| 3 | substrate_temperature_during_decomposition_unit_K | xsd:float | no | yes | "300.0"^^http://www.w3.org/2001/XMLSchema#float |
| 4 | process_gas | ottr:IRI | no | yes | dpm:Ar |
| 5 | process_pressure_unit_pascal | xsd:float | yes | yes | no |
| 6 | base_pressure_unit_pascal | xsd:float | yes | yes | no |
| 7 | homogeneity-mechanism_used | xsd:boolean | yes | yes | no |
| 8 | magnetfield_orientation | owl:Class | yes | yes | no |
| 9 | fieldstrength_unit_T | xsd:float | yes | yes | no |
| 10 | generator_type | NEList<owl:Class> | no | yes | no |
| 11 | mag_field_strength_above_target_unit_T | NEList<xsd:float> | no | yes | no |
| 12 | source_tilt_angle_unit_deg | NEList<xsd:float> | no | yes | no |
| 13 | distance_to_sample_unit_m | NEList<xsd:float> | no | yes | no |
| 14 | power_unit_W | NEList<xsd:float> | no | yes | no |
| 15 | initial_presputter_time_unit_s | xsd:float | yes | yes | no |
| 16 | expected_deposition_rate_unit_angstroem_divby_s | xsd:float | yes | yes | no |
| 17 | deposition_time_unit_s | xsd:float | yes | yes | no |
🛈 stOTTR serialisation of the template without annotation instances.
dpm:SampleProductionThinFilmSampleSputterParameters[
ottr:IRI ?sputter_parameter_name,
NEList<ottr:IRI> ?sources,
xsd:float ?substrate_temperature_during_decomposition_unit_K="300.0"^^xsd:float,
ottr:IRI ?process_gas=dpm:Ar,
? xsd:float ?process_pressure_unit_pascal,
? xsd:float ?base_pressure_unit_pascal,
? xsd:boolean ?homogeneity-mechanism_used,
? owl:Class ?magnetfield_orientation,
? xsd:float ?fieldstrength_unit_T,
NEList<owl:Class> ?generator_type,
NEList<xsd:float> ?mag_field_strength_above_target_unit_T,
NEList<xsd:float> ?source_tilt_angle_unit_deg,
NEList<xsd:float> ?distance_to_sample_unit_m,
NEList<xsd:float> ?power_unit_W,
? xsd:float ?initial_presputter_time_unit_s,
? xsd:float ?expected_deposition_rate_unit_angstroem_divby_s,
? xsd:float ?deposition_time_unit_s
] :: {
ottr:Triple(?sputter_parameter_name, pmd:characteristic, _:blank505),
ottr:Triple(?sputter_parameter_name, pmd:input, _:blank502),
o-owl-ax:SubClassOf(dpm:ANGSTROM_divby_SEC, qudt:Unit),
o-owl-ax:SubClassOf(dpm:BasePressure, qudt:Pressure),
o-owl-ax:SubClassOf(dpm:DepositionTime, qudt:Time),
o-owl-ax:SubClassOf(dpm:ExpectedDepositionRate, pmd:ValueObject),
o-owl-ax:SubClassOf(dpm:HomogeneityMechanism, pmd:ManufacturingProcess),
o-owl-ax:SubClassOf(dpm:InitialPreSputterTime, qudt:Time),
o-owl-ax:SubClassOf(dpm:ProcessPressure, qudt:Pressure),
o-owl-ax:SubClassOf(dpm:Sputtering, pmd:ManufactureProcess),
o-owl-ax:SubClassOf(dpm:SubstrateTemperature, qudt:Temperature),
o-rdf:Type(?sputter_parameter_name, dpm:Sputtering),
o-rdfs:Label(dpm:ANGSTROM_divby_SEC, "ANGSTROM divby SEC"),
o-rdfs:Label(dpm:BasePressure, "Base Pressure"),
o-rdfs:Label(dpm:DepositionTime, "Deposition Time"),
o-rdfs:Label(dpm:ExpectedDepositionRate, "Expected Deposition Rate"),
o-rdfs:Label(dpm:HomogeneityMechanism, "Homogeneity Mechanism"),
o-rdfs:Label(dpm:InitialPreSputterTime, "Initial Pre-Sputter Time"),
o-rdfs:Label(dpm:ProcessPressure, "Process Pressure"),
o-rdfs:Label(dpm:Sputtering, "Sputtering"),
o-rdfs:Label(dpm:SubstrateTemperature, "Substrate Temperature"),
dpm:HasAtmosphere(_:blank502, ?process_gas),
dpm:HasCharacteristicCategorical(?sputter_parameter_name, (pmd:Measurement, dpm:HomogeneityMechanism), ?homogeneity-mechanism_used),
dpm:HasCharacteristicCategorical(?sputter_parameter_name, (pmd:SetPoint, ?magnetfield_orientation), none),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, qudt:MagneticField), ?fieldstrength_unit_T, qudt:T),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:BasePressure), ?base_pressure_unit_pascal, qudt:PA),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:DepositionTime), ?deposition_time_unit_s, qudt:SEC),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:ExpectedDepositionRate), ?expected_deposition_rate_unit_angstroem_divby_s, dpm:ANGSTROM_divby_SEC),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:InitialPreSputterTime), ?initial_presputter_time_unit_s, qudt:SEC),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:ProcessPressure), ?process_pressure_unit_pascal, qudt:PA),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:SubstrateTemperature), ?substrate_temperature_during_decomposition_unit_K, qudt:K),
zipMin | dpm:SputterSourceProcessParameter(_:blank505, ++?sources, ++?generator_type, ++?mag_field_strength_above_target_unit_T, ++?source_tilt_angle_unit_deg, ++?distance_to_sample_unit_m, ++?power_unit_W)
} .🛈 The pattern of the template is illustrated by expanding a generated instance. Below the generated instance is shown in different serialisations, and its expansion is presented in different formats.
dpm:SampleProductionThinFilmSampleSputterParameters(x:argument1, (x:argument2-1, x:argument2-2), _:argument3, x:argument4, _:argument5, _:argument6, _:argument7, x:argument8, _:argument9, (x:argument10-1, x:argument10-2), (_:argument11-1, _:argument11-2), (_:argument12-1, _:argument12-2), (_:argument13-1, _:argument13-2), (_:argument14-1, _:argument14-2), _:argument15, _:argument16, _:argument17)RDF/wOTTR
[ ottr:of dpm:SampleProductionThinFilmSampleSputterParameters ;
ottr:values ( x:argument1 ( x:argument2-1 x:argument2-2 )
[]
x:argument4
[]
[]
[]
x:argument8
[]
( x:argument10-1 x:argument10-2 )
( []
[]
)
( []
[]
)
( []
[]
)
( []
[]
)
[]
[]
[]
)
] .🛈 Each resource node is linked to its IRI. Type relationships are not visualised, rather each node contains its type.
x:argument10-1 rdfs:subClassOf pmd:ProcessingNode .
dpm:ANGSTROM_divby_SEC
rdfs:label "ANGSTROM divby SEC" ;
rdfs:subClassOf qudt:Unit .
dpm:DistanceSourceToSample
rdfs:label "Distance Source to Sample" ;
rdfs:subClassOf qudt:Distance .
dpm:HomogeneityMechanism
rdfs:label "Homogeneity Mechanism" ;
rdfs:subClassOf pmd:ManufacturingProcess .
qudt:M rdfs:subClassOf qudt:Unit .
dpm:SourceTiltAngle rdfs:label "Source Tilt Angle" ;
rdfs:subClassOf qudt:Angle .
dpm:ProcessPressure rdfs:label "Process Pressure" ;
rdfs:subClassOf qudt:Pressure .
dpm:ExpectedDepositionRate
rdfs:label "Expected Deposition Rate" ;
rdfs:subClassOf pmd:ValueObject .
qudt:PA rdfs:subClassOf qudt:Unit .
qudt:W rdfs:subClassOf qudt:Unit .
qudt:K rdfs:subClassOf qudt:Unit .
dpm:BasePressure rdfs:label "Base Pressure" ;
rdfs:subClassOf qudt:Pressure .
qudt:DEG rdfs:subClassOf qudt:Unit .
dpm:SubstrateTemperature
rdfs:label "Substrate Temperature" ;
rdfs:subClassOf qudt:Temperature .
qudt:MagneticFieldAboveTarget
rdfs:label "Magnetic Field Above Target" ;
rdfs:subClassOf qudt:MagneticField .
x:argument1 rdf:type dpm:Sputtering ;
pmd:characteristic [ rdf:type dpm:BasePressure , pmd:SetPoint ;
pmd:unit qudt:PA ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:ProcessPressure , pmd:SetPoint ;
pmd:unit qudt:PA ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:DepositionTime , pmd:SetPoint ;
pmd:unit qudt:SEC ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:ExpectedDepositionRate , pmd:SetPoint ;
pmd:unit dpm:ANGSTROM_divby_SEC ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:SubstrateTemperature , pmd:SetPoint ;
pmd:unit qudt:K ;
pmd:value []
] ;
pmd:characteristic [ rdf:type qudt:MagneticField , pmd:SetPoint ;
pmd:unit qudt:T ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:InitialPreSputterTime , pmd:SetPoint ;
pmd:unit qudt:SEC ;
pmd:value []
] ;
pmd:characteristic [ pmd:characteristic [ rdf:type qudt:Power , pmd:SetPoint ;
pmd:unit qudt:W ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:DistanceSourceToSample , pmd:SetPoint ;
pmd:unit qudt:M ;
pmd:value []
] ;
pmd:characteristic [ rdf:type qudt:MagneticFieldAboveTarget , pmd:SetPoint ;
pmd:unit qudt:T ;
pmd:value []
] ;
pmd:characteristic [ rdf:type qudt:Power , pmd:SetPoint ;
pmd:unit qudt:W ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:SourceTiltAngle , pmd:SetPoint ;
pmd:unit qudt:DEG ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:DistanceSourceToSample , pmd:SetPoint ;
pmd:unit qudt:M ;
pmd:value []
] ;
pmd:characteristic [ rdf:type dpm:SourceTiltAngle , pmd:SetPoint ;
pmd:unit qudt:DEG ;
pmd:value []
] ;
pmd:characteristic [ rdf:type qudt:MagneticFieldAboveTarget , pmd:SetPoint ;
pmd:unit qudt:T ;
pmd:value []
] ;
pmd:input x:argument2-2 , x:argument2-1
] ;
pmd:input [ pmd:characteristic [ rdf:type pmd:SetPoint , dpm:Atmosphere ;
dpm:relatesToComposition x:argument4
]
] ;
dpm:characteristic [ pmd:value []
] .
dpm:DepositionTime rdfs:label "Deposition Time" ;
rdfs:subClassOf qudt:Time .
x:argument10-2 rdfs:subClassOf pmd:ProcessingNode .
dpm:Sputtering rdfs:label "Sputtering" ;
rdfs:subClassOf pmd:ManufactureProcess .
qudt:SEC rdfs:subClassOf qudt:Unit .
dpm:InitialPreSputterTime
rdfs:label "Initial Pre-Sputter Time" ;
rdfs:subClassOf qudt:Time .
qudt:T rdfs:subClassOf qudt:Unit .🛈 Click the list to expand/contract one list element. Click 'expand/contact all' to expand/contract all elements. Note that the interactive expansion is not correct for instances that are marked by list expanders.
dpm:SampleProductionThinFilmSampleSputterParameters(x:argument1, (x:argument2-1, x:argument2-2), _:argument3, x:argument4, _:argument5, _:argument6, _:argument7, x:argument8, _:argument9, (x:argument10-1, x:argument10-2), (_:argument11-1, _:argument11-2), (_:argument12-1, _:argument12-2), (_:argument13-1, _:argument13-2), (_:argument14-1, _:argument14-2), _:argument15, _:argument16, _:argument17)ottr:Triple(x:argument1, pmd:characteristic, _:blank1147)ottr:Triple(x:argument1, pmd:input, _:blank1146)o-owl-ax:SubClassOf(dpm:ProcessPressure, qudt:Pressure)ottr:Triple(dpm:ProcessPressure, rdfs:subClassOf, qudt:Pressure)o-owl-ax:SubClassOf(dpm:BasePressure, qudt:Pressure)ottr:Triple(dpm:BasePressure, rdfs:subClassOf, qudt:Pressure)o-owl-ax:SubClassOf(dpm:ANGSTROM_divby_SEC, qudt:Unit)ottr:Triple(dpm:ANGSTROM_divby_SEC, rdfs:subClassOf, qudt:Unit)o-owl-ax:SubClassOf(dpm:HomogeneityMechanism, pmd:ManufacturingProcess)ottr:Triple(dpm:HomogeneityMechanism, rdfs:subClassOf, pmd:ManufacturingProcess)o-owl-ax:SubClassOf(dpm:InitialPreSputterTime, qudt:Time)ottr:Triple(dpm:InitialPreSputterTime, rdfs:subClassOf, qudt:Time)o-owl-ax:SubClassOf(dpm:SubstrateTemperature, qudt:Temperature)ottr:Triple(dpm:SubstrateTemperature, rdfs:subClassOf, qudt:Temperature)o-owl-ax:SubClassOf(dpm:ExpectedDepositionRate, pmd:ValueObject)ottr:Triple(dpm:ExpectedDepositionRate, rdfs:subClassOf, pmd:ValueObject)o-owl-ax:SubClassOf(dpm:DepositionTime, qudt:Time)ottr:Triple(dpm:DepositionTime, rdfs:subClassOf, qudt:Time)o-owl-ax:SubClassOf(dpm:Sputtering, pmd:ManufactureProcess)ottr:Triple(dpm:Sputtering, rdfs:subClassOf, pmd:ManufactureProcess)o-rdf:Type(x:argument1, dpm:Sputtering)ottr:Triple(x:argument1, rdf:type, dpm:Sputtering)o-rdfs:Label(dpm:BasePressure, "Base Pressure")ottr:Triple(dpm:BasePressure, rdfs:label, "Base Pressure")o-rdfs:Label(dpm:InitialPreSputterTime, "Initial Pre-Sputter Time")ottr:Triple(dpm:InitialPreSputterTime, rdfs:label, "Initial Pre-Sputter Time")o-rdfs:Label(dpm:HomogeneityMechanism, "Homogeneity Mechanism")ottr:Triple(dpm:HomogeneityMechanism, rdfs:label, "Homogeneity Mechanism")o-rdfs:Label(dpm:SubstrateTemperature, "Substrate Temperature")ottr:Triple(dpm:SubstrateTemperature, rdfs:label, "Substrate Temperature")o-rdfs:Label(dpm:Sputtering, "Sputtering")ottr:Triple(dpm:Sputtering, rdfs:label, "Sputtering")o-rdfs:Label(dpm:ExpectedDepositionRate, "Expected Deposition Rate")ottr:Triple(dpm:ExpectedDepositionRate, rdfs:label, "Expected Deposition Rate")o-rdfs:Label(dpm:ProcessPressure, "Process Pressure")ottr:Triple(dpm:ProcessPressure, rdfs:label, "Process Pressure")o-rdfs:Label(dpm:DepositionTime, "Deposition Time")ottr:Triple(dpm:DepositionTime, rdfs:label, "Deposition Time")o-rdfs:Label(dpm:ANGSTROM_divby_SEC, "ANGSTROM divby SEC")ottr:Triple(dpm:ANGSTROM_divby_SEC, rdfs:label, "ANGSTROM divby SEC")dpm:HasAtmosphere(_:blank1146, x:argument4)ottr:Triple(_:blank1146, pmd:characteristic, _:blank1148)ottr:Triple(_:blank1148, dpm:relatesToComposition, x:argument4)cross | o-rdf:Type(_:blank1148, ++(dpm:Atmosphere, pmd:SetPoint))ottr:Triple(_:blank1148, rdf:type, (dpm:Atmosphere, pmd:SetPoint))dpm:HasCharacteristicCategorical(x:argument1, (pmd:SetPoint, x:argument8), none)ottr:Triple(_:blank1153, pmd:value, none)ottr:Triple(x:argument1, dpm:characteristic, _:blank1153)dpm:ValueObject(_:blank1153, (pmd:SetPoint, x:argument8), none, none)ottr:Triple(_:blank1153, pmd:value, none)ottr:Triple(_:blank1153, pmd:unit, none)cross | o-rdf:Type(_:blank1153, ++(pmd:SetPoint, x:argument8))ottr:Triple(_:blank1153, rdf:type, (pmd:SetPoint, x:argument8))dpm:HasCharacteristicCategorical(x:argument1, (pmd:Measurement, dpm:HomogeneityMechanism), _:argument7)ottr:Triple(_:blank1162, pmd:value, _:argument7)ottr:Triple(x:argument1, dpm:characteristic, _:blank1162)dpm:ValueObject(_:blank1162, (pmd:Measurement, dpm:HomogeneityMechanism), none, none)ottr:Triple(_:blank1162, pmd:value, none)ottr:Triple(_:blank1162, pmd:unit, none)cross | o-rdf:Type(_:blank1162, ++(pmd:Measurement, dpm:HomogeneityMechanism))ottr:Triple(_:blank1162, rdf:type, (pmd:Measurement, dpm:HomogeneityMechanism))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:ExpectedDepositionRate), _:argument16, dpm:ANGSTROM_divby_SEC)ottr:Triple(x:argument1, pmd:characteristic, _:blank1149)o-owl-ax:SubClassOf(dpm:ANGSTROM_divby_SEC, qudt:Unit)ottr:Triple(dpm:ANGSTROM_divby_SEC, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1149, (pmd:SetPoint, dpm:ExpectedDepositionRate), _:argument16, dpm:ANGSTROM_divby_SEC)ottr:Triple(_:blank1149, pmd:value, _:argument16)ottr:Triple(_:blank1149, pmd:unit, dpm:ANGSTROM_divby_SEC)cross | o-rdf:Type(_:blank1149, ++(pmd:SetPoint, dpm:ExpectedDepositionRate))ottr:Triple(_:blank1149, rdf:type, (pmd:SetPoint, dpm:ExpectedDepositionRate))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:ProcessPressure), _:argument5, qudt:PA)ottr:Triple(x:argument1, pmd:characteristic, _:blank1150)o-owl-ax:SubClassOf(qudt:PA, qudt:Unit)ottr:Triple(qudt:PA, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1150, (pmd:SetPoint, dpm:ProcessPressure), _:argument5, qudt:PA)ottr:Triple(_:blank1150, pmd:value, _:argument5)ottr:Triple(_:blank1150, pmd:unit, qudt:PA)cross | o-rdf:Type(_:blank1150, ++(pmd:SetPoint, dpm:ProcessPressure))ottr:Triple(_:blank1150, rdf:type, (pmd:SetPoint, dpm:ProcessPressure))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:DepositionTime), _:argument17, qudt:SEC)ottr:Triple(x:argument1, pmd:characteristic, _:blank1151)o-owl-ax:SubClassOf(qudt:SEC, qudt:Unit)ottr:Triple(qudt:SEC, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1151, (pmd:SetPoint, dpm:DepositionTime), _:argument17, qudt:SEC)ottr:Triple(_:blank1151, pmd:value, _:argument17)ottr:Triple(_:blank1151, pmd:unit, qudt:SEC)cross | o-rdf:Type(_:blank1151, ++(pmd:SetPoint, dpm:DepositionTime))ottr:Triple(_:blank1151, rdf:type, (pmd:SetPoint, dpm:DepositionTime))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:SubstrateTemperature), _:argument3, qudt:K)ottr:Triple(x:argument1, pmd:characteristic, _:blank1152)o-owl-ax:SubClassOf(qudt:K, qudt:Unit)ottr:Triple(qudt:K, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1152, (pmd:SetPoint, dpm:SubstrateTemperature), _:argument3, qudt:K)ottr:Triple(_:blank1152, pmd:value, _:argument3)ottr:Triple(_:blank1152, pmd:unit, qudt:K)cross | o-rdf:Type(_:blank1152, ++(pmd:SetPoint, dpm:SubstrateTemperature))ottr:Triple(_:blank1152, rdf:type, (pmd:SetPoint, dpm:SubstrateTemperature))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:BasePressure), _:argument6, qudt:PA)ottr:Triple(x:argument1, pmd:characteristic, _:blank1154)o-owl-ax:SubClassOf(qudt:PA, qudt:Unit)ottr:Triple(qudt:PA, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1154, (pmd:SetPoint, dpm:BasePressure), _:argument6, qudt:PA)ottr:Triple(_:blank1154, pmd:value, _:argument6)ottr:Triple(_:blank1154, pmd:unit, qudt:PA)cross | o-rdf:Type(_:blank1154, ++(pmd:SetPoint, dpm:BasePressure))ottr:Triple(_:blank1154, rdf:type, (pmd:SetPoint, dpm:BasePressure))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:InitialPreSputterTime), _:argument15, qudt:SEC)ottr:Triple(x:argument1, pmd:characteristic, _:blank1160)o-owl-ax:SubClassOf(qudt:SEC, qudt:Unit)ottr:Triple(qudt:SEC, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1160, (pmd:SetPoint, dpm:InitialPreSputterTime), _:argument15, qudt:SEC)ottr:Triple(_:blank1160, pmd:value, _:argument15)ottr:Triple(_:blank1160, pmd:unit, qudt:SEC)cross | o-rdf:Type(_:blank1160, ++(pmd:SetPoint, dpm:InitialPreSputterTime))ottr:Triple(_:blank1160, rdf:type, (pmd:SetPoint, dpm:InitialPreSputterTime))dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, qudt:MagneticField), _:argument9, qudt:T)ottr:Triple(x:argument1, pmd:characteristic, _:blank1161)o-owl-ax:SubClassOf(qudt:T, qudt:Unit)ottr:Triple(qudt:T, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1161, (pmd:SetPoint, qudt:MagneticField), _:argument9, qudt:T)ottr:Triple(_:blank1161, pmd:value, _:argument9)ottr:Triple(_:blank1161, pmd:unit, qudt:T)cross | o-rdf:Type(_:blank1161, ++(pmd:SetPoint, qudt:MagneticField))ottr:Triple(_:blank1161, rdf:type, (pmd:SetPoint, qudt:MagneticField))zipMin | dpm:SputterSourceProcessParameter(_:blank1147, ++(x:argument2-1, x:argument2-2), ++(x:argument10-1, x:argument10-2), ++(_:argument11-1, _:argument11-2), ++(_:argument12-1, _:argument12-2), ++(_:argument13-1, _:argument13-2), ++(_:argument14-1, _:argument14-2))ottr:Triple(_:blank1147, pmd:input, (x:argument2-1, x:argument2-2))o-owl-ax:SubClassOf(dpm:DistanceSourceToSample, qudt:Distance)ottr:Triple(dpm:DistanceSourceToSample, rdfs:subClassOf, qudt:Distance)o-owl-ax:SubClassOf(qudt:MagneticFieldAboveTarget, qudt:MagneticField)ottr:Triple(qudt:MagneticFieldAboveTarget, rdfs:subClassOf, qudt:MagneticField)o-owl-ax:SubClassOf((x:argument10-1, x:argument10-2), pmd:ProcessingNode)ottr:Triple((x:argument10-1, x:argument10-2), rdfs:subClassOf, pmd:ProcessingNode)o-owl-ax:SubClassOf(dpm:SourceTiltAngle, qudt:Angle)ottr:Triple(dpm:SourceTiltAngle, rdfs:subClassOf, qudt:Angle)o-rdfs:Label(dpm:DistanceSourceToSample, "Distance Source to Sample")ottr:Triple(dpm:DistanceSourceToSample, rdfs:label, "Distance Source to Sample")o-rdfs:Label(dpm:SourceTiltAngle, "Source Tilt Angle")ottr:Triple(dpm:SourceTiltAngle, rdfs:label, "Source Tilt Angle")o-rdfs:Label(qudt:MagneticFieldAboveTarget, "Magnetic Field Above Target")ottr:Triple(qudt:MagneticFieldAboveTarget, rdfs:label, "Magnetic Field Above Target")dpm:HasCharacteristicCategorical(_:blank1147, (pmd:Measurement, (x:argument10-1, x:argument10-2)), none)ottr:Triple(_:blank1158, pmd:value, none)ottr:Triple(_:blank1147, dpm:characteristic, _:blank1158)dpm:ValueObject(_:blank1158, (pmd:Measurement, (x:argument10-1, x:argument10-2)), none, none)ottr:Triple(_:blank1158, pmd:value, none)ottr:Triple(_:blank1158, pmd:unit, none)cross | o-rdf:Type(_:blank1158, ++(pmd:Measurement, (x:argument10-1, x:argument10-2)))ottr:Triple(_:blank1158, rdf:type, (pmd:Measurement, (x:argument10-1, x:argument10-2)))dpm:HasCharacteristicNumerical(_:blank1147, (pmd:SetPoint, dpm:SourceTiltAngle), (_:argument12-1, _:argument12-2), qudt:DEG)ottr:Triple(_:blank1147, pmd:characteristic, _:blank1155)o-owl-ax:SubClassOf(qudt:DEG, qudt:Unit)ottr:Triple(qudt:DEG, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1155, (pmd:SetPoint, dpm:SourceTiltAngle), (_:argument12-1, _:argument12-2), qudt:DEG)ottr:Triple(_:blank1155, pmd:value, (_:argument12-1, _:argument12-2))ottr:Triple(_:blank1155, pmd:unit, qudt:DEG)cross | o-rdf:Type(_:blank1155, ++(pmd:SetPoint, dpm:SourceTiltAngle))ottr:Triple(_:blank1155, rdf:type, (pmd:SetPoint, dpm:SourceTiltAngle))dpm:HasCharacteristicNumerical(_:blank1147, (pmd:SetPoint, qudt:Power), (_:argument14-1, _:argument14-2), qudt:W)ottr:Triple(_:blank1147, pmd:characteristic, _:blank1156)o-owl-ax:SubClassOf(qudt:W, qudt:Unit)ottr:Triple(qudt:W, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1156, (pmd:SetPoint, qudt:Power), (_:argument14-1, _:argument14-2), qudt:W)ottr:Triple(_:blank1156, pmd:value, (_:argument14-1, _:argument14-2))ottr:Triple(_:blank1156, pmd:unit, qudt:W)cross | o-rdf:Type(_:blank1156, ++(pmd:SetPoint, qudt:Power))ottr:Triple(_:blank1156, rdf:type, (pmd:SetPoint, qudt:Power))dpm:HasCharacteristicNumerical(_:blank1147, (pmd:SetPoint, qudt:MagneticFieldAboveTarget), (_:argument11-1, _:argument11-2), qudt:T)ottr:Triple(_:blank1147, pmd:characteristic, _:blank1157)o-owl-ax:SubClassOf(qudt:T, qudt:Unit)ottr:Triple(qudt:T, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1157, (pmd:SetPoint, qudt:MagneticFieldAboveTarget), (_:argument11-1, _:argument11-2), qudt:T)ottr:Triple(_:blank1157, pmd:value, (_:argument11-1, _:argument11-2))ottr:Triple(_:blank1157, pmd:unit, qudt:T)cross | o-rdf:Type(_:blank1157, ++(pmd:SetPoint, qudt:MagneticFieldAboveTarget))ottr:Triple(_:blank1157, rdf:type, (pmd:SetPoint, qudt:MagneticFieldAboveTarget))dpm:HasCharacteristicNumerical(_:blank1147, (pmd:SetPoint, dpm:DistanceSourceToSample), (_:argument13-1, _:argument13-2), qudt:M)ottr:Triple(_:blank1147, pmd:characteristic, _:blank1159)o-owl-ax:SubClassOf(qudt:M, qudt:Unit)ottr:Triple(qudt:M, rdfs:subClassOf, qudt:Unit)dpm:ValueObject(_:blank1159, (pmd:SetPoint, dpm:DistanceSourceToSample), (_:argument13-1, _:argument13-2), qudt:M)ottr:Triple(_:blank1159, pmd:value, (_:argument13-1, _:argument13-2))ottr:Triple(_:blank1159, pmd:unit, qudt:M)cross | o-rdf:Type(_:blank1159, ++(pmd:SetPoint, dpm:DistanceSourceToSample))ottr:Triple(_:blank1159, rdf:type, (pmd:SetPoint, dpm:DistanceSourceToSample))🛈 The graph shows all the templates that this template depends on. The colour of the node indicates its namespace. Each node is linked to its documentation page.
🛈 The number in parenthesis is the number of instances of each template.
🛈 The templates in this library that depend on this template.
None found.
🛈 Dependency graph metrics. Depth is the number of steps to a leaf node in the dependency graph. Branching is the number of outgoing edges from a node.
Direct dependencies
| Complete expansion
|
Direct dependencies
| Complete expansion
|
dpm:SampleProductionThinFilmSampleSputterParameters[
ottr:IRI ?sputter_parameter_name,
NEList<ottr:IRI> ?sources,
xsd:float ?substrate_temperature_during_decomposition_unit_K="300.0"^^xsd:float,
ottr:IRI ?process_gas=dpm:Ar,
? xsd:float ?process_pressure_unit_pascal,
? xsd:float ?base_pressure_unit_pascal,
? xsd:boolean ?homogeneity-mechanism_used,
? owl:Class ?magnetfield_orientation,
? xsd:float ?fieldstrength_unit_T,
NEList<owl:Class> ?generator_type,
NEList<xsd:float> ?mag_field_strength_above_target_unit_T,
NEList<xsd:float> ?source_tilt_angle_unit_deg,
NEList<xsd:float> ?distance_to_sample_unit_m,
NEList<xsd:float> ?power_unit_W,
? xsd:float ?initial_presputter_time_unit_s,
? xsd:float ?expected_deposition_rate_unit_angstroem_divby_s,
? xsd:float ?deposition_time_unit_s
] :: {
ottr:Triple(?sputter_parameter_name, pmd:characteristic, _:blank505),
ottr:Triple(?sputter_parameter_name, pmd:input, _:blank502),
o-owl-ax:SubClassOf(dpm:ANGSTROM_divby_SEC, qudt:Unit),
o-owl-ax:SubClassOf(dpm:BasePressure, qudt:Pressure),
o-owl-ax:SubClassOf(dpm:DepositionTime, qudt:Time),
o-owl-ax:SubClassOf(dpm:ExpectedDepositionRate, pmd:ValueObject),
o-owl-ax:SubClassOf(dpm:HomogeneityMechanism, pmd:ManufacturingProcess),
o-owl-ax:SubClassOf(dpm:InitialPreSputterTime, qudt:Time),
o-owl-ax:SubClassOf(dpm:ProcessPressure, qudt:Pressure),
o-owl-ax:SubClassOf(dpm:Sputtering, pmd:ManufactureProcess),
o-owl-ax:SubClassOf(dpm:SubstrateTemperature, qudt:Temperature),
o-rdf:Type(?sputter_parameter_name, dpm:Sputtering),
o-rdfs:Label(dpm:ANGSTROM_divby_SEC, "ANGSTROM divby SEC"),
o-rdfs:Label(dpm:BasePressure, "Base Pressure"),
o-rdfs:Label(dpm:DepositionTime, "Deposition Time"),
o-rdfs:Label(dpm:ExpectedDepositionRate, "Expected Deposition Rate"),
o-rdfs:Label(dpm:HomogeneityMechanism, "Homogeneity Mechanism"),
o-rdfs:Label(dpm:InitialPreSputterTime, "Initial Pre-Sputter Time"),
o-rdfs:Label(dpm:ProcessPressure, "Process Pressure"),
o-rdfs:Label(dpm:Sputtering, "Sputtering"),
o-rdfs:Label(dpm:SubstrateTemperature, "Substrate Temperature"),
dpm:HasAtmosphere(_:blank502, ?process_gas),
dpm:HasCharacteristicCategorical(?sputter_parameter_name, (pmd:Measurement, dpm:HomogeneityMechanism), ?homogeneity-mechanism_used),
dpm:HasCharacteristicCategorical(?sputter_parameter_name, (pmd:SetPoint, ?magnetfield_orientation), none),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, qudt:MagneticField), ?fieldstrength_unit_T, qudt:T),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:BasePressure), ?base_pressure_unit_pascal, qudt:PA),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:DepositionTime), ?deposition_time_unit_s, qudt:SEC),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:ExpectedDepositionRate), ?expected_deposition_rate_unit_angstroem_divby_s, dpm:ANGSTROM_divby_SEC),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:InitialPreSputterTime), ?initial_presputter_time_unit_s, qudt:SEC),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:ProcessPressure), ?process_pressure_unit_pascal, qudt:PA),
dpm:HasCharacteristicNumerical(?sputter_parameter_name, (pmd:SetPoint, dpm:SubstrateTemperature), ?substrate_temperature_during_decomposition_unit_K, qudt:K),
zipMin | dpm:SputterSourceProcessParameter(_:blank505, ++?sources, ++?generator_type, ++?mag_field_strength_above_target_unit_T, ++?source_tilt_angle_unit_deg, ++?distance_to_sample_unit_m, ++?power_unit_W)
} .
dpm:SampleProductionThinFilmSampleSputterParameters
rdf:type ottr:Template ;
ottr:parameters ( [ ottr:name "sputter_parameter_name" ;
ottr:type ottr:IRI ;
ottr:variable _:b0
]
[ ottr:name "sources" ;
ottr:type ( ottr:NEList ottr:IRI ) ;
ottr:variable _:b1
]
[ ottr:default "300.0"^^xsd:float ;
ottr:name "substrate_temperature_during_decomposition_unit_K" ;
ottr:type xsd:float ;
ottr:variable _:b2
]
[ ottr:default dpm:Ar ;
ottr:name "process_gas" ;
ottr:type ottr:IRI ;
ottr:variable _:b3
]
[ ottr:modifier ottr:optional ;
ottr:name "process_pressure_unit_pascal" ;
ottr:type xsd:float ;
ottr:variable _:b4
]
[ ottr:modifier ottr:optional ;
ottr:name "base_pressure_unit_pascal" ;
ottr:type xsd:float ;
ottr:variable _:b5
]
[ ottr:modifier ottr:optional ;
ottr:name "homogeneity-mechanism_used" ;
ottr:type xsd:boolean ;
ottr:variable _:b6
]
[ ottr:modifier ottr:optional ;
ottr:name "magnetfield_orientation" ;
ottr:type owl:Class ;
ottr:variable _:b7
]
[ ottr:modifier ottr:optional ;
ottr:name "fieldstrength_unit_T" ;
ottr:type xsd:float ;
ottr:variable _:b8
]
[ ottr:name "generator_type" ;
ottr:type ( ottr:NEList owl:Class ) ;
ottr:variable _:b9
]
[ ottr:name "mag_field_strength_above_target_unit_T" ;
ottr:type ( ottr:NEList xsd:float ) ;
ottr:variable _:b10
]
[ ottr:name "source_tilt_angle_unit_deg" ;
ottr:type ( ottr:NEList xsd:float ) ;
ottr:variable _:b11
]
[ ottr:name "distance_to_sample_unit_m" ;
ottr:type ( ottr:NEList xsd:float ) ;
ottr:variable _:b12
]
[ ottr:name "power_unit_W" ;
ottr:type ( ottr:NEList xsd:float ) ;
ottr:variable _:b13
]
[ ottr:modifier ottr:optional ;
ottr:name "initial_presputter_time_unit_s" ;
ottr:type xsd:float ;
ottr:variable _:b14
]
[ ottr:modifier ottr:optional ;
ottr:name "expected_deposition_rate_unit_angstroem_divby_s" ;
ottr:type xsd:float ;
ottr:variable _:b15
]
[ ottr:modifier ottr:optional ;
ottr:name "deposition_time_unit_s" ;
ottr:type xsd:float ;
ottr:variable _:b16
]
) ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint qudt:MagneticField )
_:b8
qudt:T
)
] ;
ottr:pattern [ ottr:of ottr:Triple ;
ottr:values ( _:b0
pmd:input
_:b17
)
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:ProcessPressure qudt:Pressure )
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:ExpectedDepositionRate "Expected Deposition Rate" )
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:InitialPreSputterTime qudt:Time )
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:HomogeneityMechanism pmd:ManufacturingProcess )
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:BasePressure qudt:Pressure )
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:SubstrateTemperature qudt:Temperature )
] ;
ottr:pattern [ ottr:of ottr:Triple ;
ottr:values ( _:b0
pmd:characteristic
_:b18
)
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint dpm:SubstrateTemperature )
_:b2
qudt:K
)
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:ExpectedDepositionRate pmd:ValueObject )
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicCategorical ;
ottr:values ( _:b0
( pmd:Measurement dpm:HomogeneityMechanism )
_:b6
)
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:BasePressure "Base Pressure" )
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint dpm:ExpectedDepositionRate )
_:b15
dpm:ANGSTROM_divby_SEC
)
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:DepositionTime "Deposition Time" )
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:SubstrateTemperature "Substrate Temperature" )
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicCategorical ;
ottr:values ( _:b0
( pmd:SetPoint
_:b7
)
ottr:none
)
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:Sputtering "Sputtering" )
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:HomogeneityMechanism "Homogeneity Mechanism" )
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint dpm:ProcessPressure )
_:b4
qudt:PA
)
] ;
ottr:pattern [ ottr:of dpm:HasAtmosphere ;
ottr:values ( _:b17
_:b3
)
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint dpm:DepositionTime )
_:b16
qudt:SEC
)
] ;
ottr:pattern [ ottr:of o-rdf:Type ;
ottr:values ( _:b0
dpm:Sputtering
)
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:DepositionTime qudt:Time )
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:ANGSTROM_divby_SEC "ANGSTROM divby SEC" )
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:Sputtering pmd:ManufactureProcess )
] ;
ottr:pattern [ ottr:of o-owl-ax:SubClassOf ;
ottr:values ( dpm:ANGSTROM_divby_SEC qudt:Unit )
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:ProcessPressure "Process Pressure" )
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint dpm:BasePressure )
_:b5
qudt:PA
)
] ;
ottr:pattern [ ottr:of o-rdfs:Label ;
ottr:values ( dpm:InitialPreSputterTime "Initial Pre-Sputter Time" )
] ;
ottr:pattern [ ottr:of dpm:HasCharacteristicNumerical ;
ottr:values ( _:b0
( pmd:SetPoint dpm:InitialPreSputterTime )
_:b14
qudt:SEC
)
] ;
ottr:pattern [ ottr:arguments ( [ ottr:value _:b18 ]
[ ottr:modifier ottr:listExpand ;
ottr:value _:b1
]
[ ottr:modifier ottr:listExpand ;
ottr:value _:b9
]
[ ottr:modifier ottr:listExpand ;
ottr:value _:b10
]
[ ottr:modifier ottr:listExpand ;
ottr:value _:b11
]
[ ottr:modifier ottr:listExpand ;
ottr:value _:b12
]
[ ottr:modifier ottr:listExpand ;
ottr:value _:b13
]
) ;
ottr:modifier ottr:zipMin ;
ottr:of dpm:SputterSourceProcessParameter
] .🛈 Prefixes are removed from all listings on this page for readability, but are listed here in RDF Turtle format.
@prefix ottr: <http://ns.ottr.xyz/0.4/>. @prefix qudt: <http://qudt.org/vocab/>. @prefix o-owl-ax: <http://tpl.ottr.xyz/owl/axiom/0.1/>. @prefix o-rdf: <http://tpl.ottr.xyz/rdf/0.1/>. @prefix o-rdfs: <http://tpl.ottr.xyz/rdfs/0.2/>. @prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#>. @prefix xsd: <http://www.w3.org/2001/XMLSchema#>. @prefix owl: <http://www.w3.org/2002/07/owl#>. @prefix pmd: <https://w3id.org/pmd/co/>. @prefix dpm: <https://www.dipromag.de/dipromag_onto/0.1/>.