Template: dpm:MeasurementXRF

URI: https://www.dipromag.de/dipromag_onto/0.1/MeasurementXRF

Parameters

🛈 The parameters defined by the signature are listed here. Unfortunately parameter names are not informative; fixing it is a planned future feature. An optional parameter will accept the value ottr:none as an argument. A parameter which allows blanks will accept a blank node as argument value.

Index	Name	Type	Optional	Blanks allowed	Default value
1	measurement_XRF	ottr:IRI	no	yes	no
2	sample	ottr:IRI	no	yes	no
3	radiation_source	owl:Class	no	yes	dpm:AgSource
4	source_voltage_unit_V	xsd:float	yes	yes	no
5	source_current_unit_A	xsd:float	yes	yes	no
6	chamber_atmosphere	owl:Class	no	yes	dpm:He
7	chamber_material	owl:Class	no	yes	dpm:Teflon
8	energy_resolution_unit_eV	xsd:float	no	yes	"0.2"^^http://www.w3.org/2001/XMLSchema#float

Pattern

stOTTR

🛈 stOTTR serialisation of the template without annotation instances.

dpm:MeasurementXRF[
    ottr:IRI ?measurement_XRF,
    ottr:IRI ?sample,
    owl:Class ?radiation_source=dpm:AgSource,
    ? xsd:float ?source_voltage_unit_V,
    ? xsd:float ?source_current_unit_A,
    owl:Class ?chamber_atmosphere=dpm:He,
    owl:Class ?chamber_material=dpm:Teflon,
    xsd:float ?energy_resolution_unit_eV="0.2"^^xsd:float
] :: {
    ottr:Triple(?measurement_XRF, pmd:executedBy, _:blank505),
    ottr:Triple(?measurement_XRF, pmd:input, _:blank502),
    ottr:Triple(_:blank502, pmd:composedOf, ?sample),
    o-owl-ax:SubClassOf(dpm:ChamberAtmosphere, pmd:ChemicalComposition),
    o-owl-ax:SubClassOf(dpm:ChamberMaterial, pmd:ChemicalComposition),
    o-owl-ax:SubClassOf(dpm:EnergyResolution, qudt:Energy),
    o-owl-ax:SubClassOf(dpm:RadiationSource, pmd:ChemicalComposition),
    o-owl-ax:SubClassOf(dpm:SourceCurrent, qudt:ElectricCurrent),
    o-owl-ax:SubClassOf(dpm:SourceVoltage, qudt:Voltage),
    o-owl-ax:SubClassOf(dpm:XRF, pmd:MeasuringDevice),
    o-owl-ax:SubClassOf(dpm:XRFMeasuringProcess, pmd:MeasuringProcess),
    o-rdf:Type(?measurement_XRF, dpm:XRFMeasuringProcess),
    o-rdf:Type(_:blank502, pmd:Specimen),
    o-rdf:Type(_:blank505, dpm:XRF),
    o-rdfs:Label(dpm:ChamberAtmosphere, "Chamber Atmosphere"),
    o-rdfs:Label(dpm:ChamberMaterial, "Chamber Material"),
    o-rdfs:Label(dpm:EnergyResolution, "Energy Resolution"),
    o-rdfs:Label(dpm:RadiationSource, "Radiation Source"),
    o-rdfs:Label(dpm:SourceCurrent, "Source Current"),
    o-rdfs:Label(dpm:SourceVoltage, "Source Voltage"),
    o-rdfs:Label(dpm:XRF, "XRF"),
    o-rdfs:Label(dpm:XRFMeasuringProcess, "XRF Measuring Process"),
    dpm:HasCharacteristicCategorical(?measurement_XRF, (pmd:SetPoint, ?chamber_atmosphere, dpm:ChamberAtmosphere), none),
    dpm:HasCharacteristicCategorical(?measurement_XRF, (pmd:SetPoint, ?chamber_material, dpm:ChamberMaterial), none),
    dpm:HasCharacteristicCategorical(?measurement_XRF, (pmd:SetPoint, ?radiation_source, dpm:RadiationSource), none),
    dpm:HasCharacteristicNumerical(?measurement_XRF, (pmd:SetPoint, dpm:SourceCurrent), ?source_current_unit_A, qudt:A),
    dpm:HasCharacteristicNumerical(?measurement_XRF, (pmd:SetPoint, dpm:SourceCurrent), ?energy_resolution_unit_eV, qudt:EV),
    dpm:HasCharacteristicNumerical(?measurement_XRF, (pmd:SetPoint, dpm:SourceVoltage), ?source_voltage_unit_V, qudt:V)
} .

🛈 The pattern of the template is illustrated by expanding a generated instance. Below the generated instance is shown in different serialisations, and its expansion is presented in different formats.

Generated instance

stOTTR

dpm:MeasurementXRF(x:argument1, x:argument2, x:argument3, _:argument4, _:argument5, x:argument6, x:argument7, _:argument8)

RDF/wOTTR

[ ottr:of      dpm:MeasurementXRF ;
  ottr:values  ( x:argument1 x:argument2 x:argument3
                 [] 
                 [] 
                 x:argument6 x:argument7
                 [] 
               )
] .

Visualisation of expanded RDF graph

🛈 Each resource node is linked to its IRI. Type relationships are not visualised, rather each node contains its type.

Hierarchical horizontal layout (dot)

Hierarchical vertical layout (dot)

Spring model layout (neato)

Spring model layout (fdp)

Radial layout (twopi)

Circular layout (circo)

Expanded RDF graph

dpm:ChamberMaterial  rdfs:label  "Chamber Material" ;
        rdfs:subClassOf  pmd:ChemicalComposition .

dpm:EnergyResolution  rdfs:label  "Energy Resolution" ;
        rdfs:subClassOf  qudt:Energy .

qudt:V  rdfs:subClassOf  qudt:Unit .

x:argument1  rdf:type       dpm:XRFMeasuringProcess ;
        pmd:characteristic  [ rdf:type   dpm:SourceVoltage , pmd:SetPoint ;
                              pmd:unit   qudt:V ;
                              pmd:value  [] 
                            ] ;
        pmd:characteristic  [ rdf:type   dpm:SourceCurrent , pmd:SetPoint ;
                              pmd:unit   qudt:EV ;
                              pmd:value  [] 
                            ] ;
        pmd:characteristic  [ rdf:type   dpm:SourceCurrent , pmd:SetPoint ;
                              pmd:unit   qudt:A ;
                              pmd:value  [] 
                            ] ;
        pmd:executedBy      [ rdf:type  dpm:XRF ] ;
        pmd:input           [ rdf:type        pmd:Specimen ;
                              pmd:composedOf  x:argument2
                            ] .

qudt:EV  rdfs:subClassOf  qudt:Unit .

dpm:ChamberAtmosphere
        rdfs:label       "Chamber Atmosphere" ;
        rdfs:subClassOf  pmd:ChemicalComposition .

dpm:XRF  rdfs:label      "XRF" ;
        rdfs:subClassOf  pmd:MeasuringDevice .

dpm:SourceVoltage  rdfs:label  "Source Voltage" ;
        rdfs:subClassOf  qudt:Voltage .

qudt:A  rdfs:subClassOf  qudt:Unit .

dpm:XRFMeasuringProcess
        rdfs:label       "XRF Measuring Process" ;
        rdfs:subClassOf  pmd:MeasuringProcess .

dpm:RadiationSource  rdfs:label  "Radiation Source" ;
        rdfs:subClassOf  pmd:ChemicalComposition .

dpm:SourceCurrent  rdfs:label  "Source Current" ;
        rdfs:subClassOf  qudt:ElectricCurrent .

Interactive expansion

🛈 Click the list to expand/contract one list element. Click 'expand/contact all' to expand/contract all elements. Note that the interactive expansion is not correct for instances that are marked by list expanders.

dpm:MeasurementXRF(x:argument1, x:argument2, x:argument3, _:argument4, _:argument5, x:argument6, x:argument7, _:argument8)

ottr:Triple(_:blank1526, pmd:composedOf, x:argument2)ottr:Triple(x:argument1, pmd:input, _:blank1526)ottr:Triple(x:argument1, pmd:executedBy, _:blank1527)

o-owl-ax:SubClassOf(dpm:SourceCurrent, qudt:ElectricCurrent)

ottr:Triple(dpm:SourceCurrent, rdfs:subClassOf, qudt:ElectricCurrent)

o-owl-ax:SubClassOf(dpm:XRF, pmd:MeasuringDevice)

ottr:Triple(dpm:XRF, rdfs:subClassOf, pmd:MeasuringDevice)

o-owl-ax:SubClassOf(dpm:XRFMeasuringProcess, pmd:MeasuringProcess)

ottr:Triple(dpm:XRFMeasuringProcess, rdfs:subClassOf, pmd:MeasuringProcess)

o-owl-ax:SubClassOf(dpm:ChamberMaterial, pmd:ChemicalComposition)

ottr:Triple(dpm:ChamberMaterial, rdfs:subClassOf, pmd:ChemicalComposition)

o-owl-ax:SubClassOf(dpm:EnergyResolution, qudt:Energy)

ottr:Triple(dpm:EnergyResolution, rdfs:subClassOf, qudt:Energy)

o-owl-ax:SubClassOf(dpm:ChamberAtmosphere, pmd:ChemicalComposition)

ottr:Triple(dpm:ChamberAtmosphere, rdfs:subClassOf, pmd:ChemicalComposition)

o-owl-ax:SubClassOf(dpm:RadiationSource, pmd:ChemicalComposition)

ottr:Triple(dpm:RadiationSource, rdfs:subClassOf, pmd:ChemicalComposition)

o-owl-ax:SubClassOf(dpm:SourceVoltage, qudt:Voltage)

ottr:Triple(dpm:SourceVoltage, rdfs:subClassOf, qudt:Voltage)

o-rdf:Type(x:argument1, dpm:XRFMeasuringProcess)

ottr:Triple(x:argument1, rdf:type, dpm:XRFMeasuringProcess)

o-rdf:Type(_:blank1527, dpm:XRF)

ottr:Triple(_:blank1527, rdf:type, dpm:XRF)

o-rdf:Type(_:blank1526, pmd:Specimen)

ottr:Triple(_:blank1526, rdf:type, pmd:Specimen)

o-rdfs:Label(dpm:ChamberMaterial, "Chamber Material")

ottr:Triple(dpm:ChamberMaterial, rdfs:label, "Chamber Material")

o-rdfs:Label(dpm:SourceCurrent, "Source Current")

ottr:Triple(dpm:SourceCurrent, rdfs:label, "Source Current")

o-rdfs:Label(dpm:SourceVoltage, "Source Voltage")

ottr:Triple(dpm:SourceVoltage, rdfs:label, "Source Voltage")

o-rdfs:Label(dpm:ChamberAtmosphere, "Chamber Atmosphere")

ottr:Triple(dpm:ChamberAtmosphere, rdfs:label, "Chamber Atmosphere")

o-rdfs:Label(dpm:XRFMeasuringProcess, "XRF Measuring Process")

ottr:Triple(dpm:XRFMeasuringProcess, rdfs:label, "XRF Measuring Process")

o-rdfs:Label(dpm:RadiationSource, "Radiation Source")

ottr:Triple(dpm:RadiationSource, rdfs:label, "Radiation Source")

o-rdfs:Label(dpm:XRF, "XRF")

ottr:Triple(dpm:XRF, rdfs:label, "XRF")

o-rdfs:Label(dpm:EnergyResolution, "Energy Resolution")

ottr:Triple(dpm:EnergyResolution, rdfs:label, "Energy Resolution")

dpm:HasCharacteristicCategorical(x:argument1, (pmd:SetPoint, x:argument3, dpm:RadiationSource), none)

ottr:Triple(_:blank1528, pmd:value, none)ottr:Triple(x:argument1, dpm:characteristic, _:blank1528)

dpm:ValueObject(_:blank1528, (pmd:SetPoint, x:argument3, dpm:RadiationSource), none, none)

ottr:Triple(_:blank1528, pmd:value, none)ottr:Triple(_:blank1528, pmd:unit, none)

cross | o-rdf:Type(_:blank1528, ++(pmd:SetPoint, x:argument3, dpm:RadiationSource))

ottr:Triple(_:blank1528, rdf:type, (pmd:SetPoint, x:argument3, dpm:RadiationSource))

dpm:HasCharacteristicCategorical(x:argument1, (pmd:SetPoint, x:argument6, dpm:ChamberAtmosphere), none)

ottr:Triple(_:blank1530, pmd:value, none)ottr:Triple(x:argument1, dpm:characteristic, _:blank1530)

dpm:ValueObject(_:blank1530, (pmd:SetPoint, x:argument6, dpm:ChamberAtmosphere), none, none)

ottr:Triple(_:blank1530, pmd:value, none)ottr:Triple(_:blank1530, pmd:unit, none)

cross | o-rdf:Type(_:blank1530, ++(pmd:SetPoint, x:argument6, dpm:ChamberAtmosphere))

ottr:Triple(_:blank1530, rdf:type, (pmd:SetPoint, x:argument6, dpm:ChamberAtmosphere))

dpm:HasCharacteristicCategorical(x:argument1, (pmd:SetPoint, x:argument7, dpm:ChamberMaterial), none)

ottr:Triple(_:blank1532, pmd:value, none)ottr:Triple(x:argument1, dpm:characteristic, _:blank1532)

dpm:ValueObject(_:blank1532, (pmd:SetPoint, x:argument7, dpm:ChamberMaterial), none, none)

ottr:Triple(_:blank1532, pmd:value, none)ottr:Triple(_:blank1532, pmd:unit, none)

cross | o-rdf:Type(_:blank1532, ++(pmd:SetPoint, x:argument7, dpm:ChamberMaterial))

ottr:Triple(_:blank1532, rdf:type, (pmd:SetPoint, x:argument7, dpm:ChamberMaterial))

dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:SourceCurrent), _:argument5, qudt:A)

ottr:Triple(x:argument1, pmd:characteristic, _:blank1529)

o-owl-ax:SubClassOf(qudt:A, qudt:Unit)

ottr:Triple(qudt:A, rdfs:subClassOf, qudt:Unit)

dpm:ValueObject(_:blank1529, (pmd:SetPoint, dpm:SourceCurrent), _:argument5, qudt:A)

ottr:Triple(_:blank1529, pmd:value, _:argument5)ottr:Triple(_:blank1529, pmd:unit, qudt:A)

cross | o-rdf:Type(_:blank1529, ++(pmd:SetPoint, dpm:SourceCurrent))

ottr:Triple(_:blank1529, rdf:type, (pmd:SetPoint, dpm:SourceCurrent))

dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:SourceCurrent), _:argument8, qudt:EV)

ottr:Triple(x:argument1, pmd:characteristic, _:blank1531)

o-owl-ax:SubClassOf(qudt:EV, qudt:Unit)

ottr:Triple(qudt:EV, rdfs:subClassOf, qudt:Unit)

dpm:ValueObject(_:blank1531, (pmd:SetPoint, dpm:SourceCurrent), _:argument8, qudt:EV)

ottr:Triple(_:blank1531, pmd:value, _:argument8)ottr:Triple(_:blank1531, pmd:unit, qudt:EV)

cross | o-rdf:Type(_:blank1531, ++(pmd:SetPoint, dpm:SourceCurrent))

ottr:Triple(_:blank1531, rdf:type, (pmd:SetPoint, dpm:SourceCurrent))

dpm:HasCharacteristicNumerical(x:argument1, (pmd:SetPoint, dpm:SourceVoltage), _:argument4, qudt:V)

ottr:Triple(x:argument1, pmd:characteristic, _:blank1533)

o-owl-ax:SubClassOf(qudt:V, qudt:Unit)

ottr:Triple(qudt:V, rdfs:subClassOf, qudt:Unit)

dpm:ValueObject(_:blank1533, (pmd:SetPoint, dpm:SourceVoltage), _:argument4, qudt:V)

ottr:Triple(_:blank1533, pmd:value, _:argument4)ottr:Triple(_:blank1533, pmd:unit, qudt:V)

cross | o-rdf:Type(_:blank1533, ++(pmd:SetPoint, dpm:SourceVoltage))

ottr:Triple(_:blank1533, rdf:type, (pmd:SetPoint, dpm:SourceVoltage))

Dependencies

Dependency graph

🛈 The graph shows all the templates that this template depends on. The colour of the node indicates its namespace. Each node is linked to its documentation page.

Hierarchical horizontal layout (dot)

Hierarchical vertical layout (dot)

Spring model layout (neato)

Spring model layout (fdp)

Radial layout (twopi)

Circular layout (circo)

List of dependencies

🛈 The number in parenthesis is the number of instances of each template.

dpm:MeasurementXRF

ottr:Triple (3)

o-owl-ax:SubClassOf (8)

ottr:Triple (1)

o-rdf:Type (3)

ottr:Triple (1)

o-rdfs:Label (8)

ottr:Triple (1)

dpm:HasCharacteristicCategorical (3)

ottr:Triple (2)

dpm:ValueObject (1)

ottr:Triple (2)

o-rdf:Type (1)

ottr:Triple (1)

dpm:HasCharacteristicNumerical (3)

ottr:Triple (1)

o-owl-ax:SubClassOf (1)

ottr:Triple (1)

dpm:ValueObject (1)

ottr:Triple (2)

o-rdf:Type (1)

ottr:Triple (1)

Depending templates

🛈 The templates in this library that depend on this template.

None found.

Metrics

🛈 Dependency graph metrics. Depth is the number of steps to a leaf node in the dependency graph. Branching is the number of outgoing edges from a node.

Max. dependency depth: 4
Min. dependency depth: 1
Max. branching: 28
Min. branching: 1

Templates used

Direct dependencies

Number of instances: 28
Templates used: (6 templates)
- ottr:Triple (3)
- o-owl-ax:SubClassOf (8)
- o-rdf:Type (3)
- o-rdfs:Label (8)
- dpm:HasCharacteristicCategorical (3)
- dpm:HasCharacteristicNumerical (3)

Complete expansion

Number of instances: 93
Templates used: (8 templates)
- ottr:Triple (52)
- o-owl-ax:SubClassOf (11)
- o-rdf:Type (9)
- o-rdfs:Label (8)
- dpm:HasCharacteristicCategorical (3)
- dpm:HasCharacteristicNumerical (3)
- dpm:MeasurementXRF (1)
- dpm:ValueObject (6)

Vocabulary introduced

Direct dependencies

Namespaces introduced: (3)
- pmd: https://w3id.org/pmd/co/
- dpm: https://www.dipromag.de/dipromag_onto/0.1/
- qudt: http://qudt.org/vocab/

Complete expansion

Namespaces introduced: (5)
- rdf: http://www.w3.org/1999/02/22-rdf-syntax-ns#
  - rdf:type
- pmd: https://w3id.org/pmd/co/
- dpm: https://www.dipromag.de/dipromag_onto/0.1/
- rdfs: http://www.w3.org/2000/01/rdf-schema#
  - rdfs:label
  - rdfs:subClassOf
- qudt: http://qudt.org/vocab/

Serialisations

stOTTR

dpm:MeasurementXRF[
    ottr:IRI ?measurement_XRF,
    ottr:IRI ?sample,
    owl:Class ?radiation_source=dpm:AgSource,
    ? xsd:float ?source_voltage_unit_V,
    ? xsd:float ?source_current_unit_A,
    owl:Class ?chamber_atmosphere=dpm:He,
    owl:Class ?chamber_material=dpm:Teflon,
    xsd:float ?energy_resolution_unit_eV="0.2"^^xsd:float
] :: {
    ottr:Triple(?measurement_XRF, pmd:executedBy, _:blank505),
    ottr:Triple(?measurement_XRF, pmd:input, _:blank502),
    ottr:Triple(_:blank502, pmd:composedOf, ?sample),
    o-owl-ax:SubClassOf(dpm:ChamberAtmosphere, pmd:ChemicalComposition),
    o-owl-ax:SubClassOf(dpm:ChamberMaterial, pmd:ChemicalComposition),
    o-owl-ax:SubClassOf(dpm:EnergyResolution, qudt:Energy),
    o-owl-ax:SubClassOf(dpm:RadiationSource, pmd:ChemicalComposition),
    o-owl-ax:SubClassOf(dpm:SourceCurrent, qudt:ElectricCurrent),
    o-owl-ax:SubClassOf(dpm:SourceVoltage, qudt:Voltage),
    o-owl-ax:SubClassOf(dpm:XRF, pmd:MeasuringDevice),
    o-owl-ax:SubClassOf(dpm:XRFMeasuringProcess, pmd:MeasuringProcess),
    o-rdf:Type(?measurement_XRF, dpm:XRFMeasuringProcess),
    o-rdf:Type(_:blank502, pmd:Specimen),
    o-rdf:Type(_:blank505, dpm:XRF),
    o-rdfs:Label(dpm:ChamberAtmosphere, "Chamber Atmosphere"),
    o-rdfs:Label(dpm:ChamberMaterial, "Chamber Material"),
    o-rdfs:Label(dpm:EnergyResolution, "Energy Resolution"),
    o-rdfs:Label(dpm:RadiationSource, "Radiation Source"),
    o-rdfs:Label(dpm:SourceCurrent, "Source Current"),
    o-rdfs:Label(dpm:SourceVoltage, "Source Voltage"),
    o-rdfs:Label(dpm:XRF, "XRF"),
    o-rdfs:Label(dpm:XRFMeasuringProcess, "XRF Measuring Process"),
    dpm:HasCharacteristicCategorical(?measurement_XRF, (pmd:SetPoint, ?chamber_atmosphere, dpm:ChamberAtmosphere), none),
    dpm:HasCharacteristicCategorical(?measurement_XRF, (pmd:SetPoint, ?chamber_material, dpm:ChamberMaterial), none),
    dpm:HasCharacteristicCategorical(?measurement_XRF, (pmd:SetPoint, ?radiation_source, dpm:RadiationSource), none),
    dpm:HasCharacteristicNumerical(?measurement_XRF, (pmd:SetPoint, dpm:SourceCurrent), ?source_current_unit_A, qudt:A),
    dpm:HasCharacteristicNumerical(?measurement_XRF, (pmd:SetPoint, dpm:SourceCurrent), ?energy_resolution_unit_eV, qudt:EV),
    dpm:HasCharacteristicNumerical(?measurement_XRF, (pmd:SetPoint, dpm:SourceVoltage), ?source_voltage_unit_V, qudt:V)
} .

RDF/wOTTR

dpm:MeasurementXRF  rdf:type  ottr:Template ;
        ottr:parameters  ( [ ottr:name      "measurement_XRF" ;
                             ottr:type      ottr:IRI ;
                             ottr:variable  _:b0
                           ]
                           [ ottr:name      "sample" ;
                             ottr:type      ottr:IRI ;
                             ottr:variable  _:b1
                           ]
                           [ ottr:default   dpm:AgSource ;
                             ottr:name      "radiation_source" ;
                             ottr:type      owl:Class ;
                             ottr:variable  _:b2
                           ]
                           [ ottr:modifier  ottr:optional ;
                             ottr:name      "source_voltage_unit_V" ;
                             ottr:type      xsd:float ;
                             ottr:variable  _:b3
                           ]
                           [ ottr:modifier  ottr:optional ;
                             ottr:name      "source_current_unit_A" ;
                             ottr:type      xsd:float ;
                             ottr:variable  _:b4
                           ]
                           [ ottr:default   dpm:He ;
                             ottr:name      "chamber_atmosphere" ;
                             ottr:type      owl:Class ;
                             ottr:variable  _:b5
                           ]
                           [ ottr:default   dpm:Teflon ;
                             ottr:name      "chamber_material" ;
                             ottr:type      owl:Class ;
                             ottr:variable  _:b6
                           ]
                           [ ottr:default   "0.2"^^xsd:float ;
                             ottr:name      "energy_resolution_unit_eV" ;
                             ottr:type      xsd:float ;
                             ottr:variable  _:b7
                           ]
                         ) ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:EnergyResolution "Energy Resolution" )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicNumerical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint dpm:SourceCurrent )
                                          _:b4
                                          qudt:A
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:XRF "XRF" )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:SourceCurrent qudt:ElectricCurrent )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:ChamberAtmosphere "Chamber Atmosphere" )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:ChamberMaterial pmd:ChemicalComposition )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:EnergyResolution qudt:Energy )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:SourceCurrent "Source Current" )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:SourceVoltage "Source Voltage" )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:SourceVoltage qudt:Voltage )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:RadiationSource pmd:ChemicalComposition )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:ChamberAtmosphere pmd:ChemicalComposition )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdf:Type ;
                           ottr:values  ( _:b0
                                          dpm:XRFMeasuringProcess
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      ottr:Triple ;
                           ottr:values  ( _:b0
                                          pmd:executedBy
                                          _:b8
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdf:Type ;
                           ottr:values  ( _:b9
                                          pmd:Specimen
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      ottr:Triple ;
                           ottr:values  ( _:b9
                                          pmd:composedOf
                                          _:b1
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicCategorical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint
                                            _:b6
                                            dpm:ChamberMaterial
                                          )
                                          ottr:none
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:XRF pmd:MeasuringDevice )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicCategorical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint
                                            _:b5
                                            dpm:ChamberAtmosphere
                                          )
                                          ottr:none
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:ChamberMaterial "Chamber Material" )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:RadiationSource "Radiation Source" )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicNumerical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint dpm:SourceCurrent )
                                          _:b7
                                          qudt:EV
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdfs:Label ;
                           ottr:values  ( dpm:XRFMeasuringProcess "XRF Measuring Process" )
                         ] ;
        ottr:pattern     [ ottr:of      o-owl-ax:SubClassOf ;
                           ottr:values  ( dpm:XRFMeasuringProcess pmd:MeasuringProcess )
                         ] ;
        ottr:pattern     [ ottr:of      o-rdf:Type ;
                           ottr:values  ( _:b8
                                          dpm:XRF
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      ottr:Triple ;
                           ottr:values  ( _:b0
                                          pmd:input
                                          _:b9
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicCategorical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint
                                            _:b2
                                            dpm:RadiationSource
                                          )
                                          ottr:none
                                        )
                         ] ;
        ottr:pattern     [ ottr:of      dpm:HasCharacteristicNumerical ;
                           ottr:values  ( _:b0
                                          ( pmd:SetPoint dpm:SourceVoltage )
                                          _:b3
                                          qudt:V
                                        )
                         ] .

Prefixes

🛈 Prefixes are removed from all listings on this page for readability, but are listed here in RDF Turtle format.

@prefix ottr:       <http://ns.ottr.xyz/0.4/>.
@prefix qudt:       <http://qudt.org/vocab/>.
@prefix o-owl-ax:   <http://tpl.ottr.xyz/owl/axiom/0.1/>.
@prefix o-rdf:      <http://tpl.ottr.xyz/rdf/0.1/>.
@prefix o-rdfs:     <http://tpl.ottr.xyz/rdfs/0.2/>.
@prefix rdf:        <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix xsd:        <http://www.w3.org/2001/XMLSchema#>.
@prefix owl:        <http://www.w3.org/2002/07/owl#>.
@prefix pmd:        <https://w3id.org/pmd/co/>.
@prefix dpm:        <https://www.dipromag.de/dipromag_onto/0.1/>.